EQUIPMENT MANUFACTURING
Multilayer cutting edge technology integrated in a single hybrid equipment, available for new thin films development and production purpose.
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EQUIPMENT MANUFACTURING
Comelec is now a part of
Comelec is now a part of
EQUIPMENT MANUFACTURING
While benefiting from the latest innovations of conventional Parylene technologies, Comelec hybrid plateforms additionally integrate dedicated independent gas panels, pumping lines and unique features to efficiently combine Parylene and inorganic materials deposition processes.
The hybrid approach together with a fully modular and independent design enables unlimited possibilities in terms of coating stack and process control.
While conventional methods to combine coatings from separate equipment are limited due to obvious productivity and quality concerns, Comelec hybrid deposition chambers open new paths towards cost efficient industrial integration of advanced coatings stacks.
This CE certified pioneering equipments are built with high-quality components and are controlled using advanced recipe-based automation system to ensure process reproducibility and production traceability.
| Overall dimensions (L x W x H) | 2250 x 1160 x 1450mm |
| Weight | 350 kg |
| Chamber size | ∅ 295 x 370 mm |
| Tooling size | ∅ 260 x 320 mm |
| Max. tooling load | 100kg |
| Dimer load capacity | 150g |
| Pumping capacity | 40 m3/h |
| Power supply required | 3 x 400V + N + PE – 50 Hz 3 x 25A – 15kW |
| Thermalized chamber | Temperature range: 20 – 80°C Power supply: 3 x 400V + PE – 50Hz 3x 14A – 9kW |
| Remote Plasma Source | Frequency: 1.7 – 3MHz Power: 3000W |
| In Situ RF capacitive Plasma Source | – |
| Standard processable materials | Parylene: C, D, N, F-VT4, F-AF4 ALD: Al 2 O 3 , TiO |
| Process temperature | Parylene: room temperature ALD: 60 – 80°C |
| Overall dimensions (L x W x H) | 2250 x 1160 x 1450 mm |
| Weight | 350 kg |
| Chamber size | ∅ 295 x 370 mm |
| Tooling size | ∅ 260 x 320 mm |
| Max. tooling load | 100kg |
| Dimer load capacity | 150g |
| Pumping capacity | 40 m3/h |
| Power supply required | 3 x 400V + N + PE – 50 Hz 3 x 25A – 15kW |
| Thermalized chamber | Temperature range: 20 – 80°C Power supply: 3 x 400V + PE – 50Hz 3x 14A – 9kW |
| Remote Plasma Source | Frequency: 1.7 – 3MHz Power: 3000W |
| In Situ RF capacitive Plasma Source | Frequency: 13.56MHz Power: 300-1000W |
| Standard processable materials | Parylene: C, D, N, F-VT4, F-AF4 PECVD: SiO 2 |
| Process temperature | Parylene: room temperature PECVD: 20 – 80°C |
